ASPE 2021 Summer Optics Event Keynote Speaker
July 15, 2021 | 10:00 A.M EDT – 12:00 P.M. EDT
Complimentary Keynote Session Open to Members and Non-members
Registration Required – Use Registration Code: Keynote
Metrology for Semiconductor Optics at Carl Zeiss SMT
The manufacturing of highly precise optical components for Microlithography is the business of Carl Zeiss SMT. The measurement accuracy for those challenging samples shall be only a fraction of the very tight specifications for the deviation from the perfect surface shape. The presentation gives an overview of the basics of interferometric testing, which is applied for that purpose, starting with historical methods of optical testing up to present challenges in EUV surface metrology.
Stefan Schulte is Principal Scientist in Optics Metrology and has been working at Carl Zeiss for 23 years. During that time, he mainly dealt with the development of various interferometric test setups for optical components which are manufactured in serial production or for special applications. Currently his main field of work is component metrology for EUV Lithography.
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