The Virtual 35th Annual Meeting has concluded. Thank you for those who attended the 35th Annual Meeting.
View full tutorial schedule here.
All Sessions are Listed in the Following Time Zone: CDT, UTC-5, Chicago
Tuesday, October 20, 2020
Time | Program |
8:30 – 8:45 a.m. | Opening Remarks |
8:45 – 9:45 a.m. | Keynote Address Dr. Reiner Garreis, Carl Zeiss, Oberkochen |
10:00 – 11:35 a.m. | Session 1: Precision Manufacturing 10:00 a.m. Introduction 10:05 a.m. Creating Production Machinery for the 4th Industrial Revolution Paul Shore, Loxham Precision 10:20 a.m. ILCentric – A new approach in centering optics for high-end applications Christian Wentz and Gerrit Goetzen, Innolite GmbH 10:35 p.m. A Study of the Micro-Structure of Diamond Turned Surfaces and the Generation Diffraction Color Takeshi Hashimoto, Ametek 10:50 a.m. Tool point receptance variation with spindle-holder-tool selection Tony Schmitz, University of Tennessee, Knoxville 11:05 a.m. Modeling and simulation of modulated tool path (MTP) turning stability Ryan Copenhaver, University of North Carolina-Charlotte ;Tony Schmitz, University of Tennessee, Knoxville 11:20 a.m. An Investigation of Magnetic-Field Assisted Mass Polishing for Precision Manufacturing of Optical Freeform Surfaces Chi-Fai Cheung, The Hong Kong Polytechnic University ;CHUNJIN WANG, State Key Laboratory of Ultra-precision Machining Technology, Department of Industrial and Systems Engineering, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, China;Kristy Loh, The Hong Kong Polytechnic University ;Lai Ting Ho, The Hong Kong Polytechnic University |
11:35 a.m. – 12:00 p.m. | Precision Manufacturing Live Discussion Live Q&A session with speakers |
12:00 – 1:00 p.m. | Exhibit Hall/Poster Session |
1:00 – 2:05 p.m. | Session 2: Precision Design 1:00 p.m. Introduction 1:05 p.m. Balanced Design Effort for Contamination Control in Precision Semiconductor Measurement Equipment Erik Hijkoop, NTS-Group;Kees Verbaan, NTS-Group ;Marcel Kouters, NTS 1:20 p.m. Design of an Ultra-precise Oscillating Blade Microtome based on Vibration Cancellation Xinlei Fu, The Chinese University of Hong Kong;Jialong CHEN;Shih-Chi Chen, The Chinese University of Hong Kong 1:35 p.m. Optomechanical spherical manipulator with an adjustable center of rotation Jan De Jong, University of Twente;koen Smelt, Demcon;Coen Blok, Demcon DAM BV;Dannis Brouwer, University of Twente 1:50 p.m. Efficient modeling for the design of a large-stroke fully flexure-based 6-DOF hexapod Marijn Nijenhuis, University of Twente ;Mark Naves, University of Twente;Wouter Hakvoort, University of Twente ;Dannis Brouwer, University of Twente |
2:05 – 3:00 p.m. | Precision Design Live Discussion Live Q&A session with speakers |
3:00 – 4:00 p.m. | Exhibit Hall & Live Networking |
Wednesday, October 21, 2020
Time | Program |
7:30 – 9:05 a.m. | Session 3: Controls & Mechatronics 7:30 a.m. Introduction 7:35 a.m. Decoupled, Open-Loop, Multi-DoF Rotation of an Under-Actuated, Spherical Permanent Magnetic Dipole Actuator Tyler Hamer, Massachusetts Institute of Technology ; Joshua Chabot, MIT Lincoln Laboratory; David Trumper, Massachusetts Institute of Technology 7:50 a.m. Magnetic Levitated Linear Scan Module with Nanometer Resolution Alexander Goos, Physik Instrumente (PI) GmbH & Co. KG; Rainer Gloess, Physik Instrumente (PI) GmbH & Co. KG 8:05 a.m. Vibration Mitigation on Precision Ball-Screw Feed-Drives Through Data-driven Tuning of Trajectory Pre-Filters Alper Dumanli, Oregon State University ; Burak Sencer, Oregon State University 8:20 a.m. Combined servo error pre-compensation and feedrate optimization using sequential linear programming Heejin Kim, University of Michigan, Ann Arbor; Chinedum Okwudire, University of Michigan 8:35 a.m. Oversampling Sensors for Precision Positioning Applications Brij Bhushan, Massachusetts Institute of Technology ; David Trumper, Massachusetts Institute of Technology 8:50 a.m. Study on Improvement of Reversal Motion of NC Moving Table by Friction Force Compensation Yusuke Inomata, Kanazawa Institute of Technology; Yoshitaka Morimoto, Kanazawa Institute of Technology; Akio Hayashi, Kanazawa Institute of Technology |
9:05 – 9:30 a.m. | Controls & Mechatronics Live Discussion Live Q&A session with speakers |
9:30 – 11:00 a.m. | Student Challenge |
9:30 – 11:30 a.m. | Exhibit Hall |
11:30 a.m. – 1:30 p.m. | Business Meeting & Awards Presentation |
1:30 – 3:05 p.m. | Session 4: Micro/Nano 1:30 p.m. Introduction 1:35 p.m. Role of precision engineering in pushing the performance limits of nanoscale additive manufacturing Sourabh Saha, Georgia Institute of Technology 1:50 p.m. Ceramic Two-Photon Printing of High Aspect Ratio Microstructures John Cortes, Lawrence Livermore National Laboratory 2:05 p.m. Towards 3D Part Fabrication Using a Micro-Scale Additive Manufacturing Tool Dipankar Behera 2:20 p.m. Polarization Based Optically Variable Devices Fabricated by Elliptical Vibration Texturing Ping Guo, Northwestern University 2:35 p.m. Design, Fabrication, and Signal Propagation Characteristics of Micro-Mechanical Logic Elements Frederick Sun, Lawrence Livermore National Laboratory 2:50 p.m. Multi-Focus Random-Access Pump-Probe Microscopy Based on Compressive Sensing Bingxu Chen, The Chinese University of Hong Kong |
3:05 – 3:30 p.m. | Micro/Nano Live Discussion Live Q&A session with speakers |
3:30 – 4:00 p.m. | Exhibit Hall & Live Networking |
Thursday, October 22, 2020
Time | Program |
8:00 – 10:00 a.m. | Exhibit Hall & Poster Sessions |
10:00 – 11:40 a.m. | Session 5: Metrology Systems 10:00 a.m. Introduction 10:05 a.m. High-precision Metrology with High-resolution Computed Tomography (or 3D X-ray Microscopes) Herminso Villarraga-Gómez, Carl Zeiss Industrial Metrology, LLC 10:35 a.m. Nanopositioning and nanomeasuring machines for cross-scale measurement with sub-nanometer precision and nanofabrication Eberhard Manske, Technische Universität Ilmenau 10:50 a.m. Moonshot Metrology Melvin Liebers, Professional Instruments Company 11:05 a.m. Phase-shifting 3D imaging of rotating milling/drilling tools Xiangyu Guo, Texas A&M University 11:25 a.m. Spindle metrology for a high resolution x-ray microscope Byron Knapp, Professional Instruments Company |
11:40 a.m. – 12:00 p.m. | Metrology Live Discussion Live Q&A session with speakers |
12:00 -1:00 p.m. | Exhibit Hall & Poster Session |
1:00 – 2:35 p.m. | Session 6: Measurement Errors & Uncertainty 1:00 p.m. Introduction 1:05 p.m. Comparison of Optical and Contact Surface Topography Measurement, Including Uncertainty Adam Thompson, University of Nottingham 1:35 p.m. Trends in geometric error of x-ray computed tomography instruments observed at different locations in the measurement volume Prashanth Jaganmohan, University of North Carolina at Charlotte 1:50 p.m. Software based accuracy improvement of 5-axis mac hine tools by compensation of rotary axis errors Theresa Spaan-Burke, IBS Precision Engineering 2:05 p.m. Development of a new standard for the performance evaluation of single axis linear positioning systems Gregory Vogl, National Institute of Standards and Technology 2:20 p.m. Flatness measurement of large surfaces applying improved sequential three-point method Shunya Yamada, Osaka Electro-Communication University |
2:35 – 3:00 p.m. | Measurement Errors & Uncertainty Live Discussion Live Q&A session with speakers |
3:00 – 4:00 p.m. | Closing Remarks & Live Networking |
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