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Session Description:
This course provides attendees with a basic introduction to EUV Lithography. Intended for beginners in the field, the course will review the fundamental components of EUV systems and address similarities and differences to optical lithography systems. In the process, a basic overview of lithography in general will also be provided. The course will also provide a snapshot of the current status of the technology as well as an overview of the most significant challenges facing the longer term extension of EUVL. Topics covered are intended to be broad going all the way from the source to the photoresists.

Patrick Naulleau received his B.S. and M.S. degrees in electrical engineering from the Rochester Institute of Technology, Rochester, NY, in 1991 and 1993, respectively. He received his Ph.D. in electrical engineering from the University of Michigan, Ann Arbor in 1997 specializing in optical signal processing and coherence theory. In 1997 Dr. Naulleau joined Berkeley Lab on the EUV LLC program building the world’s first EUV scanner. From June 2005 through March 2008, Dr. Naulleau additionally joined the faculty at the University at Albany, SUNY as Associate Professor, also concentrating in the area of EUV lithography. In April 2010 Dr. Naulleau took the position of Director of the Center for X-ray Optic at Lawrence Berkeley National Laboratory. Dr. Naulleau has over 350 publications as well as 19 Patents and is a Fellow of OSA and SPIE.