ASPE Proceedings, Precision Mechanical Design and Mechatronics for Sub-50nm Semiconductor Equipment

April 7-8, 2008

Berkeley, California
Lawrence Berkeley National Laboratory

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Introduction
Monday, April 7, 2008, 8:15 am - 8:30 am

  • Welcome and Introductory Remarks
    John S. Taylor (Lawrence Livermore National Laboratory); and Jan van Eijk (Technical University of Delft / MICE, bv)

Session I
Overview, Systems
Monday, April 7, 2008, 8:30 am - 10:00 am

Session II
Mechatronics for Advanced Lithography
Monday, April 7, 2008, 10:30 am - 12:00 pm

Poster Session
Monday, April 7, and Tuesday, April 8, 2008 -1:00 pm - 1:20 pm


Session III
Precision Positioning Systems
Monday, April 7, 2008, 1:30 pm - 3:00 pm


Session IV
Advanced Control Strategies
Monday, April 7, 2008, 3:30 pm - 5:00 pm


Session V
Advanced Lithographic Systems
Tuesday, April 8, 2008, 8:30 am - 10:00 am


Session VI
Reticle Chucking and Distortion
Tuesday, April 8, 2008, 10:30 am - 12:00 pm


Session VII
Motion Control for Novel Lithography
Tuesday, April 8, 2008, 1:30 pm - 3:00 pm


Session VIII
Advanced Actuation
Tuesday, April 8, 2008, 3:30 pm - 5:00 pm