American Society for Precision Engineering Spring Topical Meeting

MIT Laboratory for Manufacturing and Productivity Annual Summit

Precision Control for Advanced Manufacturing Systems

Sunday-Tuesday, April 21-23, 2013
Massachusetts Institute of Technology
Cambridge, Massachusetts, USA

Meeting Co-Chairmen:

David L. Trumper, Massachusetts Institute of Technology
Stephen J. Ludwick, Aerotech, Inc.
Robert H. Munnig Schmidt, Delft University of Technology

Call for Papers * Schedule * Technical Sessions * Poster Session *

Tutorials * Lab Tours* Location of Events * Committee *

The American Society for Precision Engineering and the Laboratory for Manufacturing and Productivity at the Massachusetts Institute of Technology are holding a joint meeting on Precision Control for Advanced Manufacturing Systems. This meeting will focus on new developments in feedback control as applied to advanced manufacturing systems. We also encourage presentations of a tutorial nature which elaborate principles essential to achieving high performance in precision control systems.

The control of precision systems encompasses a wide range of applications in high-speed, high-accuracy manufacturing and automation.  The growth of nanotechnology and nanoscale manufacturing has further raised the positioning requirements for machine designers.  The performance of such systems, instruments, devices, and processes depends intimately upon the innovative application of feedback principles due to the large dynamic range of controlled variables and the sensitivity to effects which might be ignorable in conventional systems.

This conference is intended to promote a broader understanding of the principles and techniques applicable for precision control, to highlight the challenges and achievements unique to our field, to bring together specialists and practitioners from industry, government, and academia for the exchange of ideas, and to identify topics for further research. The conference schedule will include significant unstructured time to allow for technical and social interactions.